Process of controlling grain growth in metal films

Metal treatment – Process of modifying or maintaining internal physical... – Producing or treating layered – bonded – welded – or...

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148536, 148679, 205157, 205224, C25D 550

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active

061267619

ABSTRACT:
A process for controlling grain growth in the microstructure of thin metal films (e.g., copper or gold) deposited onto a substrate. In one embodiment, the metal film is deposited onto the substrate to form a film having a fine-grained microstructure. The film is heated in a temperature range of 70-100.degree. C. for at least five minutes, wherein the fine-grained microstructure is converted into a stable large-grained microstructure. In another embodiment, the plated film is stored, after the step of depositing, at a temperature not greater than -20.degree. C., wherein the fine-grained microstructure is stabilized without grain growth for the entire storage period.

REFERENCES:
patent: 4576689 (1986-03-01), Makkaev et al.
patent: 5092967 (1992-03-01), Guess
Young, C.B.F., et al., "The Deposition of Copper from Phosphoric Acid Solutions", Metal Finishing, Nov. 1949, pp. 56-59.
Lamb, V.A., et al., "Physical and Mechanical Properties of Electrodeposited Copper", J of the Electrochemical Society, Nov. 1970, pp. 381C-403C.
J. W. Pattern, E. D. McClanahan, J. W. Johnston, Room-Temperature Recrystallization in Thick Bias-Sputtered Copper Deposits, Journal of Applied Physics, vol. 42, No. 11, pp 4371-4377.
"Metals Handbook," vol. 4, pp. 719-728 (9th ed., American Society for Metals, Metals Park, Ohio, 1981).
B.D. Cullity, "Elements of X-Ray Diffraction," pp. 281-323 (2d ed., Addison-Wesley, Reading, Massachusetts, 1978).
G.K. Celler, J.R. Maldonado, Materials Aspects of X-Ray Lithography, Materials Research Society Symposium Proceedings, vol. 306, Apr. 1993.
D. Winau, R. Koch, M. Weber, K.H. Rieder, Intrinsic Stress of Ag and Au Electrical Contact Films for High Temperature Superconductor Thin Films, American Institute of Physics, Appl. Physics, Lett. 61, Jul. 1992.
C.C. Wong, HI Smith, CV Thompson, Surface-energy-driven secondary Grain Growth in thin Au Films, Appl. Phys. Letter 48, Feb. 1986.
C.R. Aita, K.S. SreeHarsha, This Films: The Relationship of Structure to Properties, Materials Research Society, Symposia Proceedings, vol. 47, Apr. 1985.
Chee C. Wong, Henry I. Smith, and C.V. Thompson, Surface-Energy-Driven Secondary Grain Growth In Thin Au Films, Journal of Applied Physics Lett. vol. 48, No. 5. pp 335-337 (Feb. 1986).
R.E. Acosta, I. Babich, P. Blauner, and A. Wagner, Electrodeposited Gold: Real Time Stress and Structural Change at Room Temperature, Materials Research Society, vol. 306, pp. 265-274 (1993).

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