Process of and apparatus for laser annealing of film-like surfac

Details Process of and apparatus for laser annealing of film-like surfac Process of and apparatus for laser annealing of film-like surfac

1983-05-20

1984-10-09

Newsome, John H.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 531, 219121LZ, B23K 900

Patent

active

044761503

ABSTRACT:
A process of and related apparatus for achieving laser annealing of film-like surface layers of chemical vapor deposited silicon nitride and silicon carbide to relieve their inherent residual stresses. A laser beam is used to anneal the layers, in conjunction with a photoacoustic gas cell and related beam modulating means for utilizing a photoacoustic effect principal for monitoring, detecting and effectuating beam control as needed during the laser annealing process.

REFERENCES:
patent: 3585088 (1971-06-01), Schwuttke et al.
patent: 3700850 (1972-10-01), Lumley et al.
patent: 3873341 (1975-03-01), Janus
Dutta et al., Optical Engineering, vol. 22, No. 1, Jan./Feb. 1983, pp. 1120.

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