Process monitor

Details Process monitor Process monitor

2005-05-17

2005-05-17

Turner, Samuel A. (Department: 2877)

Optics: measuring and testing

By light interference

Spectroscopy

C438S009000

Reexamination Certificate

active

06894786

ABSTRACT:
A substrate is etched in a vacuum enclosure in a process which generates plasma light emission. The process is monitored by passing emitted light via a window, a thin film narrow band filter and a “Fabry-Perot” etalon to a detector. The output signal from the detector is analyzed by shape recognition techniques to derive a measure of the progress of the process. The shape recognition preferably makes use of digital filtering and comparison with reference data derived from the theoretical analysis or from a calibration run.

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patent: 6081334 (2000-06-01), Grimbergen et al.
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patent: 27 36 262 (1978-03-01), None
patent: 1 569 939 (1980-06-01), None
patent: 9807002 (1998-02-01), None

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