Process independent alignment marks

Details Process independent alignment marks Process independent alignment marks

2006-08-22

2006-08-22

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000, C355S067000, C356S399000

Reexamination Certificate

active

07095483

ABSTRACT:
An apparatus for aligning a mask having an image and at least one complimentary alignment mark to a substrate having a first surface and a substantially opposing second surface. The substrate further has at least one alignment mark on the second surface. A mask support supports the mask in proximity to the first surface of the substrate. A substrate support supports the substrate with the first surface in proximity to the mask. An alignment means aligns the at least one alignment mark on the second surface of the substrate to the at least one complimentary alignment mark on the mask. An exposure source projects the image of the mask onto the first surface of the substrate, and a controller controls the mask support, substrate support, alignment means, and exposure source.

REFERENCES:
patent: 5874190 (1999-02-01), Tanaka
patent: 6309943 (2001-10-01), Glenn et al.
patent: 6525805 (2003-02-01), Heinle
patent: 6529625 (2003-03-01), Sentoku et al.
patent: 1-164032 (1989-06-01), None

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