Coating apparatus – Gas or vapor deposition
Patent
1998-04-30
1999-11-23
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
156345, C23C 1600
Patent
active
059893451
ABSTRACT:
A process-gas supply apparatus for supplying a process gas to a process chamber in which a predetermined processing using the process gas is applied to the object set therein, which comprising a process-gas source for supplying a process gas, a carrier gas source filled with a carrier gas, at least one gas storing section having a predetermined volume and to be filled with the process gas, a carrier-gas introducing pipe connecting the carrier gas source to the process chamber to introduce the carrier gas from the carrier gas source to the process chamber, a process-gas releasing pipe connected to the process-gas source, a process-gas filling circuit having at least one pipe which connects the at least one gas storing section to the process-gas releasing pipe and is provided with at least one open/shut valve, a process gas releasing circuit having at least one pipe which connects the gas storing section to the carrier-gas introducing pipe and is provided with at least one open/shut valve, a controlling section for controlling not only a communication state between the process-gas releasing pipe and the gas storing section but also a communication state between the carrier-gas introducing pipe and the gas storing section, by switchover of the open/shut valves attached to the process-gas filling circuit and the process gas releasing circuit.
REFERENCES:
patent: 5575854 (1996-11-01), Jinnouchi et al.
patent: 5584963 (1996-12-01), Takahashi
patent: 5620524 (1997-04-01), Fan et al.
patent: 5777300 (1998-07-01), Homma et al.
patent: 5785796 (1998-07-01), Lee
patent: 5840368 (1998-11-01), Ohmi
Patent Abstracts of Japan, vol. 15, No. 357 (C-0866), Sep. 10, 1991, JP 3-141192, Jun. 17, 1991.
Breneman Bruce
Fieler Erin
Tokyo Electron Limited
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