Process for waste liquid-free processing of chlorosilane distill

Chemistry of inorganic compounds – Silicon or compound thereof – Elemental silicon

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210712, 405129, 423488, C01B 3300, C01B 3308

Patent

active

052466825

ABSTRACT:
A process for waste liquid-free processing of residues of chlorosilane distillations, wherein the residue is allowed to react with liquid hydrochloric acid accompanied by the release of hydrogen chloride, the resulting reaction mixture is allowed to coagulate, the solid phase is separated and dried and heat-treated, and the liquid phase and the condensed gaseous constituents are recycled into the process.

REFERENCES:
patent: 5066472 (1991-11-01), Ruff et al.
patent: 5080804 (1992-01-01), Ruff
patent: 5094830 (1992-03-01), Tom et al.
patent: 5182095 (1993-01-01), Ruff et al.

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