Process for washing semiconductor substrate with organic solvent

Chemical apparatus and process disinfecting – deodorizing – preser – Physical type apparatus – Apparatus for treating solid article or material with fluid...

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134 11, 134 12, 134109, 21050027, B01J 800, B01D 1300

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active

047880430

ABSTRACT:
Disclosed is a process for washing a semiconductor substrate with an organic solvent, which comprises the first stage of supplying an organic solvent to be used for the organic solvent washing of a semiconductor substrate to a washing device and washing the semiconductor substrate, the second stage of supplying the organic solvent containing water, electrolytes and particulate or clustery suspended substances, which has been withdrawn from the first stage, to a pervaporation device and separating and removing mainly water, and the third stage of supplying the organic solvent withdrawn from the second stage to a distillation device to obtain the organic solvent as a distillate and recycling the distillate as the organic solvent to the first stage, the three stages being combined to form a continuous circulation systems.

REFERENCES:
patent: 2953502 (1960-09-01), Binning et al.
patent: 2981680 (1961-04-01), Binning
patent: 3035060 (1962-05-01), Binning et al.
patent: 3923541 (1975-12-01), Healy
patent: 4067805 (1978-01-01), Chiang et al.
patent: 4322251 (1982-03-01), Elliott
patent: 4615768 (1986-10-01), McCord
patent: 4643774 (1987-02-01), Kishida et al.
Colclaser, R., "Microelectronics: Processing and Device Design", Wiley & Sons, 1980, p. 82.
Himmelblau, D., "Basic Principles and Calculations in Chemical Engineering", Prentice-Hall, 4th Ed., 1982, pp. 154-155.
Vossen et al., "Thin Film Processes", Academic Press, 1978, p. 413.

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