Process for UV-photopatterning of thiolate monolayers self-assem

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430311, 430315, 430322, 430324, 430396, 427377, 427387, 427539, G03F 700, G03C 516

Patent

active

055145019

ABSTRACT:
A process for creating a two dimensional spacial distribution pattern of ferent thiolate molecules on a substrate by illuminating a surface of a self-assembled monolayer of a first thiolate compound in the presence of oxygen with high frequency electromagnetic radiation distributed according to a desired pattern, and subsequently immersing the illuminated substrate in a solution of a second thiolate compound so that molecules of the first thiolate compound in illuminated areas of the monolayer are exchanged for molecules of said second thiolate compound; and a patterned biomolecular composite formed of a substrate which forms a self-assembled thiolate monolayer when immersed in a solution of a thiolate forming compound, a thiolate monolayer deposited on the substrate and composed of patterned areas of first and second thiolate compounds, respectively, the first thiolate compound having an affinity for specifically or nonspecifically adsorbing a biological molecule, and the second thiolate compound having essentially no affinity for the biological molecule, and at least one biological material adsorbed in a corresponding pattern on the patterned areas of the first thiolate compound in the thiolate monolayer.

REFERENCES:
patent: 3940912 (1976-03-01), Buchner
patent: 4410562 (1983-10-01), Nemoto et al.
patent: 4477326 (1984-10-01), Lin
patent: 4640940 (1987-02-01), Jacobine et al.
patent: 4715929 (1987-12-01), Ogawa
patent: 4948712 (1990-08-01), Inoue et al.
patent: 4964972 (1990-10-01), Sagiv et al.
patent: 4994358 (1991-02-01), Deguchi et al.
patent: 5077085 (1991-12-01), Schnur et al.
patent: 5079600 (1992-01-01), Schnur et al.
patent: 5120569 (1992-06-01), Zupanic et al.
patent: 5126007 (1992-06-01), Shmulovich
patent: 5220030 (1993-06-01), Deaton
patent: 5223117 (1993-06-01), Wrighton et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for UV-photopatterning of thiolate monolayers self-assem does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for UV-photopatterning of thiolate monolayers self-assem, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for UV-photopatterning of thiolate monolayers self-assem will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1226123

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.