Process for treating synthetic silica powder and synthetic...

Details Process for treating synthetic silica powder and synthetic... Process for treating synthetic silica powder and synthetic...

2005-11-02

2008-11-18

Zimmer, Marc S (Department: 1796)

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

C423S335000

Reexamination Certificate

active

07452518

ABSTRACT:
A process for producing a synthetic quartz glass powder which is substantially free of carbon contaminant, for reduced bubble density and improved stability of articles made from the synthetic quartz glass during fusion molding by maintaining the synthetic silica powder in an oxidizing environment, e.g., an atmosphere comprising at least 3 vol. % ozone at a temperature of less than 1400° C., causing carbon containing compounds to be reduced to less than 10 ppm.

REFERENCES:
patent: 3015541 (1962-01-01), Drake
patent: 5516350 (1996-05-01), Onoda et al.
patent: 6746655 (2004-06-01), Becker et al.
patent: 2003/0124044 (2003-07-01), Fukui et al.
patent: 56-104732 (1981-08-01), None
patent: 06-040713 (1994-02-01), None
patent: WO 2003062166 (2003-07-01), None
English language translation of portion of JP 56-104732 into English.
abstract for Uses of Ultraviolet/ozone for Hydrocarbon Removal: Applications to Surfaces of Complex Composition or Geometry authored by McIntyre et al. and published in the Journal of Vacuum Science and Technology, A: Vacuum, Surfaces, and Films (1991), 9(3, pt. 2) 1355-9.

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