Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1974-08-08
1976-07-06
Stern, Edward
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423335, 423470, 423490, C01D 304, C01B 3316, C01C 116
Patent
active
039681971
ABSTRACT:
The invention relates to a process of the treatment of sodium silico fluoride. In the invention, sodium silico fluoride is decomposed with a relatively high concentration of an aqueous ammonium solution or an ammonia gas to produce a mixed aqueous slurry solution of ammonium fluoride containing sodium fluoride and silica gels as solid materials, the obtained mixed aqueous slurry solution is separated to the ammonium fluoride solutions containing sodium fluoride and silica gels, respectively, by means of a physical method and then sodium fluoride, silica gels and the aqueous ammonium fluoride solution are manufactured in high purity and good yield, respectively. In the other way, the mixture of sodium fluoride and silica gels are separated from said mixed aqueous slurry solution by means of the filter, washed with water and dried. The dried mixture is separated to sodium fluoride and silica gels by means of a physical method.
Further, ammonium fluoride in the mixed aqueous slurry solution manufactured according to said process may be decomposed with sodium hydroxide or sodium salt to sodium fluoride and an ammonium or ammonium salts solution to be used.
REFERENCES:
patent: 3021194 (1962-02-01), Cunningham
patent: 3563699 (1971-02-01), Cuneo et al.
Fujimura Akira
Satoh Hirokazu
Onoda Chemical Industry Company, Limited
Stern Edward
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