Process for treating manganese nodules

Specialized metallurgical processes – compositions for use therei – Processes – Free metal or alloy reductant contains magnesium

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75 21, 75 80, 75 82, 75117, 75119, 75121, 423 32, 423 50, 423150, 423144, C22B 4700

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040294986

ABSTRACT:
In a process for treating manganese nodules wherein the nodules are reduced so as to convert most of the nickel, copper and cobalt impurities to their metallic state while inhibiting the conversion of the iron and manganese impurities to their metallic state, the resulting reduced ore is wet ground, if necessary, slurried and treated with an aqueous ammoniacal solution containing free oxygen to extract the metallic nickel, copper and cobalt as their ammine complexes. The iron and manganese are removed from the aqueous ammoniacal solution containing iron and manganese as impurities by leaching the slurry of reduced ore by adding sodium chloride or ammonium chloride thereto and blowing air in the leach solution which also contains sulfur dioxide.

REFERENCES:
patent: 2928732 (1960-03-01), Bare et al.
patent: 3342547 (1967-09-01), Illis et al.
patent: 3728105 (1973-04-01), Skarbo
patent: 3753686 (1973-08-01), Wilder et al.
patent: 3810827 (1974-04-01), Kane et al.
patent: 3848054 (1974-11-01), Wiewiorowski
patent: 3860689 (1975-01-01), Sefton et al.
patent: 3869360 (1975-03-01), Kane et al.
patent: 3880651 (1975-04-01), Queneau et al.

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