Process for treating a gas mixture by pressure swing adsorption

Details Process for treating a gas mixture by pressure swing adsorption Process for treating a gas mixture by pressure swing adsorption

1997-03-26

1998-06-30

Spritzer, Robert

Gas separation: processes

Solid sorption

Including reduction of pressure

95101, 95105, 95130, B01D 53053

Patent

active

057727376

ABSTRACT:
Process for treating a gas mixture by pressure swing adsorption wherein for each adsorber (1), the duration (T.sub.R) of the countercurrent recompression step is much less than that (T.sub.D) of the cocurrent decompression step. The process is particularly useful in the production of oxygen from atmospheric air.

REFERENCES:
patent: 3430418 (1969-03-01), Wagner
patent: 3564816 (1971-02-01), Batta
patent: 3636679 (1972-01-01), Batta
patent: 3788036 (1974-01-01), Lee et al.
patent: 4194890 (1980-03-01), McCombs et al.
patent: 4381189 (1983-04-01), Fuderer
patent: 4468237 (1984-08-01), Fuderer
patent: 4589888 (1986-05-01), Hiscock et al.
patent: 4643743 (1987-02-01), Grader
patent: 4816039 (1989-03-01), Krishnamurthy et al.
patent: 4981499 (1991-01-01), Hay et al.
patent: 5223004 (1993-06-01), Eteet al.
patent: 5248322 (1993-09-01), Kumar
patent: 5250088 (1993-10-01), Yamaguchi et al.
patent: 5370728 (1994-12-01), LaSala et al.
patent: 5382280 (1995-01-01), Choe et al.
patent: 5565018 (1996-10-01), Baksh et al.
patent: 5620501 (1997-04-01), Tamhankar et al.
patent: 5656065 (1997-08-01), Kalbassi et al.
patent: 5658371 (1997-08-01), Smolarek et al.

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