Process for treating a conductive surface and products...

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Forming nonmetal coating

Reexamination Certificate

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C205S205000, C205S333000, C106S014210, C428S632000, C428S469000, C428S688000

Reexamination Certificate

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06911139

ABSTRACT:
The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a silicate containing coating or film upon a metallic or conductive surface.

REFERENCES:
patent: 2780591 (1957-02-01), Frey
patent: 6153080 (2000-11-01), Heimann et al.
patent: 6322687 (2001-11-01), Heimann et al.
patent: 0 608 107 (1994-07-01), None
patent: 1 369 502 (2003-12-01), None
patent: 2000 - 226691 (2000-08-01), None
patent: 2000226691 (2000-08-01), None
patent: WO 01/71067 (2001-09-01), None
Preparation of Silica Thin Films by Electrolyses of Aqueous Solution—Masaya Chigane, Masami Ishikawa. and Masanobu Izaki—Department of Inorganic Chemistry, Osaka Municipal Technical Research Institute, Joto-ku, Osaka 536-8553. Japan—Manuscript submitted Mar. 12, 2001; revised manuscript received Jun. 17, 2002. Available electronically Aug. 14, 2002 (pp. D9-D12).
PCT Search Report, PCT/US02/24446, Jul. 15, 2004.

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