Process for thermally depositing silicon nitride and silicon dio

Details Process for thermally depositing silicon nitride and silicon dio Process for thermally depositing silicon nitride and silicon dio

1988-05-31

1989-10-31

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272552, 4272553, 437238, 437241, 437243, C23C 1634, C23C 1640

Patent

active

048776513

ABSTRACT:
A thermal CVD process for forming silicon nitride-type or silicon dioxide-type films onto a substrate comprising the steps of:

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