Process for the vapor deposition of a metal nitride-based layer

Details Process for the vapor deposition of a metal nitride-based layer Process for the vapor deposition of a metal nitride-based layer

1994-08-12

1997-04-08

Bell, Janyce

Coating processes

Optical element produced

Transparent base

427255, 4272552, 427314, 427164, 65443, B05D 506

Patent

active

056185790

ABSTRACT:
A metal nitride or oxynitride layer is pyrolytically deposited onto a transparent substrate by a process consisting of simultaneously bringing into contact at least one metal precursor and at least one amine as a nitrogen precursor into contact with said substrate which is heated for a high temperature.

REFERENCES:
patent: 3615271 (1971-10-01), Dietz
patent: 5087593 (1992-02-01), Narula
patent: 5139825 (1992-08-01), Gordon et al.
patent: 5227334 (1993-07-01), Sandhu
patent: 5330793 (1994-07-01), Winter et al.
Webster's II New Riverside University Dictionary p. 533 1984. (no mo.).

Affiliated with

Also associated with

Rating

Process for the vapor deposition of a metal nitride-based layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the vapor deposition of a metal nitride-based layer , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the vapor deposition of a metal nitride-based layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2396635