Liquid purification or separation – Processes – Ion exchange or selective sorption
Reexamination Certificate
2008-03-11
2008-03-11
Barry, Chester T. (Department: 1724)
Liquid purification or separation
Processes
Ion exchange or selective sorption
C210S688000, C210S690000, C210S691000
Reexamination Certificate
active
07341665
ABSTRACT:
A process is described for the treatment of water contaminated by apolar organic compounds and/or by heavy metals, which consists in circulating the water through a system comprising at least two types of zeolites having a silica/alumina ratio >50, placed in succession, wherein the first zeolite through which the water is passed is characterized by a high absorption capacity and structural channel dimensions ranging from 7 to 50 Å, whereas the second is characterized by a high removal capacity of molecules with a molecular diameter comparable with structural channel dimensions ranging from 5 to 7 Å.
REFERENCES:
patent: 5730948 (1998-03-01), Klatte et al.
patent: 6200483 (2001-03-01), Cutler et al.
patent: 2004/0206705 (2004-10-01), Vignola et al.
patent: 0 914 864 (1999-05-01), None
patent: 03 002461 (2003-01-01), None
Pilchowski, Kurt et al., “Adsorptive Separation of 1,2-Dichloroethane from Model Wastewater by Natural Clinoptiolite”, Acta Hydrochim. Hydrobiol., vol. 31, No. 3, pp. 249-252, 2003.
U.S. Appl. No. 10/583,448, filed Jun. 19, 2006, Vignola et al.
Cova Umberto
Della Penna Gino
Sisto Raffaello
Vignola Rodolfo
Barry Chester T.
EniTecnologie S.p.A.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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