Process for the treatment of aluminum based substrates for the p

Details Process for the treatment of aluminum based substrates for the p Process for the treatment of aluminum based substrates for the p

1993-06-17

1995-10-24

Dang, Thi

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

156665, 252 793, 252 794, 134 3, 134 41, C23F 100

Patent

active

054606942

ABSTRACT:
Process for the treatment of aluminum based substrates for the purpose of their anodic oxidation, comprising a surface treatment or chemical etching step using an acid bath comprising at least one fluorinated derivative of titanium and/or of zirconium and/or of silicium as well as at least one acid of the group comprising NO.sub.3 H, SO.sub.4 H.sub.2 and phosphoric acid.

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