Process for the stabilization of plasma generation by means of e

Details Process for the stabilization of plasma generation by means of e Process for the stabilization of plasma generation by means of e

1997-03-20

1998-07-14

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912142, 21912115, 21912134, 20429803, 427585, B23K 1000, B23K 1500

Patent

active

057808031

ABSTRACT:
The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

REFERENCES:
patent: 3562141 (1971-02-01), Morley
patent: 4311725 (1982-01-01), Holland
patent: 4511594 (1985-04-01), Yanai et al.
patent: 5286947 (1994-02-01), Clyde et al.
patent: 5316955 (1994-05-01), Govorchin
patent: 5423970 (1995-06-01), Kugler
"Activated Reactive Evaporation Process for High Rate Deposition of Compos," R.F. Bunshah & A.C. Raghuram, J. Vac. Sci. Technol., vol. 9, No. 6, Nov.-Dec. 1972, pp. 1385-1388.
"Towards a Possible Industrial Production of Ozone with an Electron-Beam-Controlled Discharge," G. Fournier et al., Proc. 4th Int. Symp. on Plasma Chemistry, Zurich 1979, Bd. 2, S. 742-747.

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