Process for the separation of zirconium and hafnium tetrachlorid

Chemistry of inorganic compounds – Halogen or compound thereof – Binary compound containing metal

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423 73, 423 81, 4232105, C01G 2504, C01G 2704

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active

040215318

ABSTRACT:
The invention relates to a process for the separation of zirconium, and hafnium tetrachlorides from mixtures thereof. The process according to the invention consists of selectively absorbing zirconium tetrachloride and hafnium tetrachloride vapors in a solvent medium circulating counter-current to these vapors in a distillation column, wherein the solvent consists of a molten chloroaluminate and/or chloroferrate of potassium. The process described may be used to obtain hafnium-free zirconium tetrachloride which may then be used to prepare nuclear-grade zirconium, and hafnium tetrachloride containing little zirconium.

REFERENCES:
patent: 2744060 (1956-05-01), Eaton
patent: 2852446 (1958-09-01), Bromberg
patent: 3294482 (1966-12-01), Lerner
patent: 3407031 (1968-10-01), Fuerer et al.
patent: 3671186 (1972-06-01), Ishizuka

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