Process for the separation of chlorosilanes from gas streams

Details Process for the separation of chlorosilanes from gas streams Process for the separation of chlorosilanes from gas streams

2007-04-17

2007-04-17

Caldarola, Glenn (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

C423S584000, C423S350000, C423S342000

Reexamination Certificate

active

10715359

ABSTRACT:
Chlorosilanes are continuously removed from a gas stream in an apparatus in which the gas stream is treated in a first stage with water vapor in the gas phase, and in a second stage with a liquid, aqueous phase.

REFERENCES:
patent: 4454104 (1984-06-01), Griesshammer et al.
patent: 4704972 (1987-11-01), Marchand
patent: 5066472 (1991-11-01), Ruff et al.
patent: 5182095 (1993-01-01), Ruff et al.
patent: 5246682 (1993-09-01), Ruff et al.
patent: 5320817 (1994-06-01), Hardwick et al.
patent: 5378444 (1995-01-01), Akita et al.
patent: 5740215 (1998-04-01), Gluschke et al.
patent: 5961695 (1999-10-01), Hasegawa et al.
patent: 6117409 (2000-09-01), Bertsch-Frank et al.
patent: 6284892 (2001-09-01), Most et al.
patent: 6322765 (2001-11-01), Muhlhofer et al.
patent: 6368568 (2002-04-01), Lord
patent: 0 089 183 (1983-09-01), None
patent: 0 216 292 (1987-04-01), None
patent: 0 532 857 (1993-03-01), None

Affiliated with

Also associated with

Rating

Process for the separation of chlorosilanes from gas streams does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the separation of chlorosilanes from gas streams, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the separation of chlorosilanes from gas streams will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3796738