Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1979-04-16
1981-03-17
Spitzer, Robert H.
Gas separation
Means within gas stream for conducting concentrate to collector
55 48, 55 89, B01D 5314, B01D 1900
Patent
active
042564719
ABSTRACT:
An improved process for the separate recovery of substantially pure ammonia and substantially pure carbon dioxide from mixtures containing ammonia and carbon dioxide, and possibly water, such as are obtained as by-products in the manufacture of melamine from urea or the synthesis of urea from ammonia and carbon dioxide. The by-product mixture is introduced into a process loop having an ammonia separation zone, a carbon dioxide separation zone and a desorption zone, the zone to which the mixture is initially fed being dependent upon its composition. The separation is effected by maintaining a system pressure differential between the ammonia and carbon dioxide separation zones, or adding diluting water to the carbon dioxide separation zone. The efficiency of the separation is enhanced by introducing a carbon dioxide containing gaseous phase, and preferably an excess of an inert gas, into the bottom of the ammonia separation zone.
REFERENCES:
patent: 3225519 (1965-12-01), Stotler
patent: 3910777 (1975-10-01), Jakob
patent: 3920419 (1975-11-01), Schroeder et al.
patent: 3972693 (1976-08-01), Wiesner et al.
patent: 4060591 (1977-11-01), Garber et al.
patent: 4093544 (1978-06-01), Ross
patent: 4120667 (1978-10-01), Gettert et al.
patent: 4163648 (1979-08-01), Biermans
Spitzer Robert H.
Stamicarbon B.V.
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