Process for the selective growth of GaAs

Fishing – trapping – and vermin destroying

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437107, 437133, 148DIG95, H01L 2120

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active

051852896

ABSTRACT:
The process is particularly useful in the fabrication of GaAs quantum well (QW) laser diodes. Starting point is a ridge-patterned (100)-substrate (21), the crystal orientation of the sidewalls, e.g., (411A)-oriented, being different from that of the horizontal top. The sidewall facets thus have a lower Ga incorporation rate.
In a molecular beam epitaxy (MBE) system, the lower AlGaAs cladding layer (22) is first grown, followed by the high-temperature growth of the active GaAs QW (23). Due to diffusion and desorption processes, the GaAs thickness at the sidewalls is smaller than on the horizontal top of the ridge. During a short growth interrupt, the GaAs completely desorbs from the sidewall facets. With the subsequent growth of the upper cladding layer (24), the QW becomes laterally embedded in higher bandgap material providing for lateral electric confinement.

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"Channelled substrate (100) GaAs MBE growth and lateral p-n junction formation of lasers," by H. P. Meier, et al., Inst. Physics Conference Serial No. 91: Ch. 7, pp. 609-612, Paper presented at International Symposium GaAs & Related Compounds, Heraklion, Greece, Sep. 28-Oct. 1, 1987.
"Patterned quantum well semiconductor injection laser grown by molecular beam epitaxy," by E. Kapon, et al., Applied Physics Letter 52 (8), pp. 607-609, Feb. 22, 1988.
"Problems related to the formation of lateral p-n junctions on channel substrate (100) GaAs for lasers," by H. P. Meier, et al., J. Vac. Sci. Technology B6 (2), pp. 692-695, Mar./Apr. 1988.

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