Process for the selective decomposition of hydrazine in a...

Details Process for the selective decomposition of hydrazine in a... Process for the selective decomposition of hydrazine in a...

2005-06-14

2005-06-14

Langel, Wayne A. (Department: 1754)

Chemistry of inorganic compounds

Nitrogen or compound thereof

C423S352000, C423S658200

Reexamination Certificate

active

06905666

ABSTRACT:
The present invention relates to a process for the selective decomposition of hydrazine in a hydrazine/substituted hydrazine/water mixture. A catalyst chosen from the group consisting of nickel supported on silica/alumina, the nickel-nickel oxide mixture supported on silica/alumina and rhodium supported on carbon is introduced into this mixture and then the mixture is heated at a temperature of between 60° C. and 120° C.

REFERENCES:
patent: 2925709 (1960-02-01), Mantell et al.
patent: 2926144 (1960-02-01), Mantell et al.
patent: 3165382 (1965-01-01), Forte
patent: 3931395 (1976-01-01), Beckert et al.
patent: 4122671 (1978-10-01), Armstrong et al.
patent: 4124538 (1978-11-01), Armstrong et al.
patent: 4157270 (1979-06-01), Martignoni et al.
patent: 4620415 (1986-11-01), Schmidt
patent: 4804527 (1989-02-01), Tatarchuk et al.
patent: 2 383 916 (1978-10-01), None
patent: 1183079 (1970-03-01), None
Schmidt, “Hydrazine and its derivatives”, A Wiley-Interscience Publication, John Wiley & Sons, pp. 604-607, no date.

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