Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1978-01-23
1979-03-20
Peters, G. O.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423395, C01R 2100
Patent
active
041453999
ABSTRACT:
A process for removing nitrogen oxides (NO.sub.x) from a waste gas containing 300 through 20,000 ppm of NO.sub.x is disclosed. In the process, the waste gas containing NO.sub.x is adjusted to a molar ratio of NO/NO.sub.2 of approximately 1 and is then scrubbed with a scrubbing solution containing an alkali metal hydroxide in a first column. The scrubbing solution is removed from the first column before the alkali metal hydroxide is completely consumed. The removed scrubbing solution is then contacted in a second column with a gas having 1.0 through 60.0% by volume NO.sub.x which has been adjusted to a molar ratio of NO/NO.sub.2 of approximately 1. Thus, the NO.sub.x content of the purified gas can be lowered to far less than 200 ppm and post-treatment problems of the scrubbed solution can be effectively solved.
REFERENCES:
patent: 1949462 (1934-03-01), Fogler
patent: 2072947 (1937-03-01), Fogler et al.
patent: 3348914 (1967-10-01), Quanquin et al.
patent: 3453071 (1969-07-01), Schmitt et al.
Webb; H. W., Absorption of Nitrous Gases, Longmans, Green & Co., N. Y., 1923, pp. 311-315.
Hatabu Yoshihiko
Nagaoka Tokuzo
Nagata Simaiti
Nishimura Takamoto
Ono Satoru
Peters G. O.
Ube Industries Ltd.
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