Process for the removal of impurities from optical component mat

Details Process for the removal of impurities from optical component mat Process for the removal of impurities from optical component mat

1984-08-14

1986-07-15

Yeung, George

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 19, 264 12, C03C 2300

Patent

active

046004424

ABSTRACT:
A process is disclosed for the removal of water and water derived impurities, e.g. OH.sup.-, substitutionally or interstitially incorporated in the structure of crystalline and amorphous materials, more specifically, in metal oxides, e.g. fused silica or aluminum oxide, wherein the material is exposed in powdered form to a gaseous mixture of halogen and carbon monoxide at a predetermined elevated temperature. The mixture of halogen and carbon monoxide reacts to cause the water and OH.sup.- ion concentration in the processed material to be reduced to an extremely low level. Materials purified by the process can be used to produce optical fibers and laser windows of excellent mechanical, thermal and optical properties.

REFERENCES:
patent: 2550173 (1951-04-01), Swinehart et al.
patent: 3026210 (1962-03-01), Coble
patent: 3114601 (1963-12-01), Letter
patent: 3282641 (1966-11-01), Sfiligoj et al.
patent: 4013796 (1977-03-01), Swinehart et al.
patent: 4315832 (1982-02-01), Pastor et al.

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