Process for the removal of hydrogen from hydrogen compounds diss

Details Process for the removal of hydrogen from hydrogen compounds diss Process for the removal of hydrogen from hydrogen compounds diss

1988-06-21

1989-06-27

Doll, John

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

423494, C01B 33107, C01G 1704

Patent

active

048428396

ABSTRACT:
By a chlorination process at a temperature exceeding 1000.degree. C. all hydrogenous compounds, including organic compounds, are converted into hydrogen-free compounds, e.g. CCl.sub.4, which do not interfere in the manufacture of optical fibres.

REFERENCES:
patent: 3754077 (1973-08-01), Kruger et al.
patent: 3790459 (1974-02-01), Kotzsch et al.
patent: 4310341 (1982-01-01), Barns et al.
Chemistry, Bailar, Jr. et al. Academic Press, 1978, p. 419.
The Solubility of HCl in SiCly; Rav. J. Chem. Thermodynamics, vol. 14, pp. 77-82 (1982).

Affiliated with

Also associated with

Rating

Process for the removal of hydrogen from hydrogen compounds diss does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the removal of hydrogen from hydrogen compounds diss, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the removal of hydrogen from hydrogen compounds diss will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-812051