Organic compounds -- part of the class 532-570 series – Organic compounds – Fatty compounds having an acid moiety which contains the...
Patent
1994-07-13
1996-08-27
Dees, Jose G.
Organic compounds -- part of the class 532-570 series
Organic compounds
Fatty compounds having an acid moiety which contains the...
554191, C11B 310
Patent
active
055502644
ABSTRACT:
A process for purifying crude ester containing residual metallic catalyst is described. The process comprises (a) adding to a crude ester product an amorphous silicon dioxide adsorbent capable of adsorbing dissolved metallic catalyst; (b) heating the combination at a temperature of between about 80.degree. C. and about 130.degree. C.; and (c) separating the ester from the adsorbent by filtration, such that residual metallic catalyst is retained on the adsorbent.
REFERENCES:
patent: 1224291 (1917-05-01), Ellis
patent: 3404011 (1968-10-01), Eolkin
patent: 4129718 (1978-12-01), Muzzio
patent: 4137398 (1979-01-01), Muzzio
patent: 4508742 (1985-04-01), McLaughlin et al.
patent: 4895681 (1990-01-01), Herrmann et al.
patent: 5026548 (1991-06-01), Evans et al.
patent: 5053169 (1991-10-01), Price
patent: 5169989 (1992-12-01), Peterson et al.
patent: 5248333 (1993-09-01), Worschech et al.
patent: 5281339 (1994-01-01), Mainwaring et al.
Material Safety Data Sheet for PM5108, Manufacturer: The PQ Corporation, Valley Forge, PA.
Ralph K. Iler, "The Colloid Chemistry of Silica and Silicates", Cornell University Press, Ithaca, New York, 1955.
Carr Deborah D.
Dees Jos,e G.
Drach John E.
Henkel Corporation
Jaeschke Wayne C.
LandOfFree
Process for the removal of dissolved metallic catalyst from este does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the removal of dissolved metallic catalyst from este, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the removal of dissolved metallic catalyst from este will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1057152