Process for the recovery of high purity tantalum oxide

Details Process for the recovery of high purity tantalum oxide Process for the recovery of high purity tantalum oxide

1984-02-29

1984-12-25

Carter, Herbert T.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group vb metal

423 62, 423 68, C01G 3500

Patent

active

044903405

ABSTRACT:
A process is disclosed for producing a high purity tantalum precipitate from an impure source by dissolving in a first hydrofluoric acid solution and digested to form a first precipitate of tantalum which dissolved in hydrochloric acid. The resulting solution is heated to form a second precipitate of tantalum which is dissolved in another hydrofluoric acid solution and digested to form a third precipitate of tantalum. The third precipitate of tantalum is then dissolved in an oxalic acid solution with the pH being adjusted to form another tantalum precipitate which is converted to tantalum oxide.

REFERENCES:
patent: 1802242 (1931-04-01), Fink et al.
patent: 3099526 (1963-07-01), Li et al.
patent: 4302243 (1981-11-01), Tamaru et al.

Affiliated with

Also associated with

Rating

Process for the recovery of high purity tantalum oxide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the recovery of high purity tantalum oxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the recovery of high purity tantalum oxide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1152218