Process for the recovery and purification of a metal alloy based

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal

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423259, 423258, C01G 4300

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active

054318912

ABSTRACT:
Process for the treatment of a metal alloy based on uranium, generally in highly enriched form and other metallic elements, comprising a fluorination treatment with the aid of at least one fluorine-containing gas, optionally with an intermediate fluorination with the aid of a fluoric compound, a distillation treatment of the gaseous fluoride flow obtained in order to obtain pure uranium hexafluoride, as well as a mixing treatment of said hexafluoride with another more depleted hexafluoride to obtain the desired final isotopic content.

REFERENCES:
patent: 2750253 (1956-06-01), Smith
patent: 3708568 (1973-02-01), Golliher et al.
patent: 3714324 (1973-01-01), Weech
patent: 3720748 (1973-03-01), Massonne
patent: 3796672 (1974-03-01), Dada et al.
patent: 3843766 (1974-11-01), Anderson et al.
patent: 4003980 (1977-01-01), Watt et al.
patent: 4012489 (1977-03-01), Watt et al.
patent: 4053559 (1977-10-01), Hart et al.
patent: 4202861 (1980-05-01), Bourgeois et al.
patent: 4234550 (1980-11-01), DeHollander
patent: 4294598 (1981-10-01), Gazda
patent: 4769180 (1988-09-01), Echigo et al.
patent: 5284605 (1994-02-01), Nicolas

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