Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1981-04-16
1983-01-04
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423393, 423400, B01A 5334
Patent
active
043672043
ABSTRACT:
The invention is regeneration and recirculation of nitrogen oxides in the exhaust gas of a nitric acid plant without using any material current and heat energy other than that generated in the process of producing nitric acid. Nitrogen oxide is recovered by at least two adsorbers each containing an acid resistant zeolite molecular sieve and operating in an alternate heat cycle; adsorption occurring at 20-40 degrees C. and regeneration at 300-350 degrees C. The hot gas exiting from the oxidation unit used in the production of nitric acid is used to regenerate the adsorbers and the nitrogen oxides set free during the said regeneration are introduced into the main feed stream of the nitric acid plant. In the final stage of the regeneration the adsorbers are cooled by rinsing them with exhaust gas or air at a temperature of 20-40 degrees C.
REFERENCES:
patent: 2674338 (1954-04-01), Lindsay et al.
patent: 3389961 (1968-06-01), Sundaresan et al.
patent: 3473893 (1969-10-01), Hardison
patent: 3674429 (1972-07-01), Collins
Olsen, Unit Processes and Principles of Chemical Engineering, Van Nostrand Company, N.Y., 1932, pp. 2-3.
Klopp Gabor
Machacs Miklos
Palmai Gyorgy
Suto Jozsef
Szasz Karoly
Budapesti Muszaki Egyetem
Katona Gabriel P.
Thomas Earl C.
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