Process for the pyrogenic production of finely divided oxide of

Details Process for the pyrogenic production of finely divided oxide of Process for the pyrogenic production of finely divided oxide of

1980-06-03

1982-08-31

Cooper, Jack

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423337, 423592, 423612, 423613, 423618, 423625, 423487, C01B 33113, C01F 702, C01G 23047, C01G 1702

Patent

active

043472290

ABSTRACT:
There is provided a pyrogenic process for the production of finely divided oxide of a metal and/or a metalloid in which there is employed as the starting material a vaporizable halogen compound of a metal and/or metalloid. Because of the starting material there is formed elemental halogen which is an impurity in the oxide formed. To remove the halogen there is supplied to the cooling section of the production plant a mixture of hydrogen and inert gas.

REFERENCES:
patent: 3416890 (1968-12-01), Best et al.
patent: 4258023 (1981-03-01), Schmid et al.

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