Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including solid – extended surface – fluid contact reaction...
Patent
1995-06-06
1996-09-17
Bhat, Nina
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including solid, extended surface, fluid contact reaction...
96121, 96126, 95140, 423235, 423220, 423247, 423248, 4236481, 423654, B01J 1900, B01D 5302, C01B 2100, C01B 302
Patent
active
055566030
ABSTRACT:
An apparatus is provided which is capable of removing impurities from an impurity-containing hydrogen gas without generating methane. A bed of particulate nickel in an amount of at least 5% by weight as elemental nickel at a temperature of from 0.degree. C. to 50.degree. C. removes all impurities except nitrogen. Then a bed of getter material, a zirconium, vanadium and iron alloy at a temperature of from 200.degree. C. to 800.degree. C. removes the nitrogen impurity thus producing purified hydrogen with an impurity content of less than 20 ppb.
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Lorimer D'Arcy
Succi Marco
Bhat Nina
SAES Getters S.p.A.
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