Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1977-02-28
1978-11-07
Mack, John H.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
C23C 1500
Patent
active
041244729
ABSTRACT:
A process for the protection of wear surfaces is provided which comprises applying a micro-thin film of hard material to the surface of a substrate of softer and preferably tougher material, the film being elastically compliant and remaining intact even when plastic deformation of the substrate material occurs. In the practice of the process of the invention, the micro-thin film of hard material does not achieve its own modulus of rigidity and, therefore, does not directly absorb impact energy, but transmits the energy to the substrate material for absorption.
REFERENCES:
patent: 3709809 (1973-01-01), Wright et al.
patent: 3755123 (1973-08-01), Davidse et al.
J. L. Mukherjee et al., "Influence of Ar Sputtering Pressure on the Adhesion of TiC Films to Steel Substrates", J. Vac. Sci. Tech., vol. 12, pp. 850-853 (1975).
W. W. Carson, "Sputter Gas Pressure & D.C. Substrate Bias Effects on Thick RF-Diode Sputtered Films of Ti Oxycarbides", J. Vac. Sci. Tech., vol. 12, pp. 845-849 (1975).
R. Bland et al., "Effect of Ion Bombardment During Deposition on Thick Metal & Ceramic Deposits", J. Vac. Sci. Tech., vol. 11, pp. 671-674 (1974).
Beecher Keith D.
Mack John H.
Weisstuch Aaron
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