Process for the production of ultrahigh purity silane with recyc

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

203 4, 203 71, 203DIG6, 423341, 423342, 423349, C01B 3304

Patent

active

043405746

ABSTRACT:
Tri- and dichlorosilanes formed by hydrogenation in the course of the reaction of metallurgical silicon, hydrogen and recycle silicon tetrachloride are employed as feed into a separation column arrangement of sequential separation columns and redistribution reactors which processes the feed into ultrahigh purity silane and recycle silicon tetrachloride. A slip stream is removed from the bottom of two sequential columns and added to the recycle silicon tetrachloride process stream causing impurities in the slip streams to be subjected to reactions in the hydrogenation step whereby waste materials can be formed and readily separated.

REFERENCES:
patent: 1957818 (1934-05-01), Carney
patent: 2450415 (1948-10-01), Benning
patent: 3031268 (1962-04-01), Shoemaker
patent: 3041141 (1962-06-01), Shoemaker et al.
patent: 3156630 (1964-11-01), Fahnoe et al.
patent: 3418338 (1966-02-01), Gilman et al.
patent: 3421984 (1969-01-01), Jensen et al.
patent: 3445345 (1969-05-01), Katzen et al.
patent: 3619407 (1971-11-01), Hendricks et al.
patent: 3968199 (1976-07-01), Bakay
patent: 4113845 (1978-09-01), Litteral

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of ultrahigh purity silane with recyc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of ultrahigh purity silane with recyc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of ultrahigh purity silane with recyc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-250011

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.