Process for the production of surface-active anionic surfactant

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – Heterogeneous arrangement

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

510452, 510457, 510469, 510488, 510491, 510495, 510470, 510475, 510536, 252353, 252354, 252356, 2523671, 159 44, 159 481, C11D 1102, B01D 118

Patent

active

056375603

ABSTRACT:
A process for the production of wetting-, washing- or cleaning-active anionic surfactant salts by reacting inorganic or organic bases with anionic surfactant intermediates containing hydrophilic negatively charged groups attached to hydrophobic hydrocarbon radicals. The salts are combined in a spray which is introduced into an inert gas phase of superheated steam whereby the spray is at least partly dried. In an embodiment of the process, the anionic surfactant intermediates are neutralized during the spraying step to form the salts.

REFERENCES:
patent: 4171243 (1979-10-01), Brooks et al.
patent: 4376010 (1983-03-01), Gauvin
patent: 4415489 (1983-11-01), Kiczek et al.
patent: 4919847 (1990-04-01), Barletta et al.
patent: 5189207 (1993-02-01), Blasey et al.
patent: 5431780 (1995-07-01), Raehse et al.
patent: 5536430 (1996-07-01), Fues et al.
Gehrman "Entwicklungstendenzen der Trocknungstechnik in der chemischen" Chem.-Ing-Tech. 62 (1990), Nr. 10, Seiten pp. 512-520.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of surface-active anionic surfactant does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of surface-active anionic surfactant , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of surface-active anionic surfactant will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-764571

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.