Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur
Reexamination Certificate
2005-03-09
2009-06-23
Vanoy, Timothy C (Department: 1793)
Chemistry of inorganic compounds
Sulfur or compound thereof
Elemental sulfur
C423S542000, C423S576200, C423S576400, C048S127300, C048S127500, C048S127700
Reexamination Certificate
active
07550132
ABSTRACT:
Process for the production of sulfur, obtained in pure form, and possibly easily disposable even at ambient temperature, starting from hydrogen sulphide contained in natural gas, which includes: a) oxidizing a portion of hydrogen sulphide to sulfur dioxide; b) dissolving in water the sulfur dioxide obtained in step (a); c) carrying out the reaction (I): 2H2S+SO2→3S+2H2O (I) making the remaining hydrogen sulphide to react with the solution prepared in step (b); and d) using the thus obtained sulfur suspension for the production sulfur or, alternatively, to use it for the disposal of the sulfur itself in a site reserved for such purpose.
REFERENCES:
patent: 2043084 (1936-06-01), Ward et al.
patent: 2724641 (1955-11-01), Butler et al.
patent: 3104951 (1963-09-01), Urban
patent: 3891743 (1975-06-01), Block et al.
patent: 5378441 (1995-01-01), Frankiewicz et al.
patent: 5753189 (1998-05-01), Rehmat
patent: 5876677 (1999-03-01), Mensinger et al.
patent: 6063357 (2000-05-01), Boucot et al.
patent: 6096280 (2000-08-01), Ellenor et al.
patent: 03 082455 (2003-10-01), None
Cobianco Sandra
De Angelis Alberto
Lockhart Thomas Paul
Palazzina Mauro
Pollesel Paolo
ENI S.p.A.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Vanoy Timothy C
LandOfFree
Process for the production of sulfur, starting from the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the production of sulfur, starting from the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of sulfur, starting from the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4142102