Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1992-09-17
1994-04-05
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430325, 430330, G03F 730, G03F 740
Patent
active
053003802
ABSTRACT:
The present invention relates to a negative photoresist consisting essentially of a process for the production of relief structures using
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Meier Kurt
Roth Martin
Ciba-Geigy Corporation
Dote Janis L.
Hall Luther A. R.
McCamish Marion E.
Teoli, Jr. William A.
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