Process for the production of precipitated silica

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

106 35, 51308, 424 49, A61K 716, A61K 718, C09K 314, C01B 3312

Patent

active

054845815

ABSTRACT:
Precipitated silica which has a BET surface area of 10-130 m.sup.2 /g, a CTAB surface area of 10-70 m.sup.2 /g , an average particle diameter of 5-20 .mu.m, a Cu abrasion value in a 10% glycerol dispersion of 4-50 mg and thickening behavior in a CMC solution (20% dispersion) of 300-3500 mPa.multidot.s, is produced by simultaneously adding alkali silicate (weight modulus SiO.sub.2 :alkali oxide=2.5-3.9:1) and a mineral acid to an initial amount of water which has been adjusted to a pH value of 7.0 to 9.9 or 10.0 to 10.7 by the addition of water glass, holding the pH value constant between 7.0 and 9.9 or 10.0 to 10.7 during addition, wherein the initial precipitation temperature is 50.degree.-90.degree. C. and an increase in viscosity occurs after at most 25% of the duration of precipitation, adjusting the pH value to .ltoreq.6, preferably 3.5, once a silica content of greater than 120 g/l or greater than 150 g/l, preferably .gtoreq.160 g/l to 240 g/l, has been reached, separating the solid by filtration, washing, drying and grinding it. The precipitated silica may be used as an abrasive and/or thickening component in toothpastes.

REFERENCES:
patent: 3235331 (1966-02-01), Nauroth et al.
patent: 3928540 (1975-12-01), Morgan
patent: 3977893 (1976-08-01), Wason
patent: 3988162 (1976-10-01), Wason
patent: 4067746 (1978-01-01), Wason et al.
patent: 4076549 (1978-02-01), Wason
patent: 4495167 (1985-01-01), Nauroth et al.
patent: 4857289 (1989-08-01), Nauroth et al.
patent: 4973462 (1990-11-01), Akira et al.
patent: 5066420 (1991-11-01), Chevallier
patent: 5110574 (1992-05-01), Reinhardt et al.
patent: 5286478 (1994-02-01), Persello

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of precipitated silica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of precipitated silica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of precipitated silica will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-307770

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.