Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1994-08-04
1996-01-16
Griffin, Ronald W.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
106 35, 51308, 424 49, A61K 716, A61K 718, C09K 314, C01B 3312
Patent
active
054845815
ABSTRACT:
Precipitated silica which has a BET surface area of 10-130 m.sup.2 /g, a CTAB surface area of 10-70 m.sup.2 /g , an average particle diameter of 5-20 .mu.m, a Cu abrasion value in a 10% glycerol dispersion of 4-50 mg and thickening behavior in a CMC solution (20% dispersion) of 300-3500 mPa.multidot.s, is produced by simultaneously adding alkali silicate (weight modulus SiO.sub.2 :alkali oxide=2.5-3.9:1) and a mineral acid to an initial amount of water which has been adjusted to a pH value of 7.0 to 9.9 or 10.0 to 10.7 by the addition of water glass, holding the pH value constant between 7.0 and 9.9 or 10.0 to 10.7 during addition, wherein the initial precipitation temperature is 50.degree.-90.degree. C. and an increase in viscosity occurs after at most 25% of the duration of precipitation, adjusting the pH value to .ltoreq.6, preferably 3.5, once a silica content of greater than 120 g/l or greater than 150 g/l, preferably .gtoreq.160 g/l to 240 g/l, has been reached, separating the solid by filtration, washing, drying and grinding it. The precipitated silica may be used as an abrasive and/or thickening component in toothpastes.
REFERENCES:
patent: 3235331 (1966-02-01), Nauroth et al.
patent: 3928540 (1975-12-01), Morgan
patent: 3977893 (1976-08-01), Wason
patent: 3988162 (1976-10-01), Wason
patent: 4067746 (1978-01-01), Wason et al.
patent: 4076549 (1978-02-01), Wason
patent: 4495167 (1985-01-01), Nauroth et al.
patent: 4857289 (1989-08-01), Nauroth et al.
patent: 4973462 (1990-11-01), Akira et al.
patent: 5066420 (1991-11-01), Chevallier
patent: 5110574 (1992-05-01), Reinhardt et al.
patent: 5286478 (1994-02-01), Persello
Esch Heinz
Kuhlmann Robert
Neumueller Mattias
Otto Karin
Rausch Ralf
Degussa - Aktiengesellschaft
Griffin Ronald W.
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