Process for the production of large boehmite particles

Details Process for the production of large boehmite particles Process for the production of large boehmite particles

1988-08-30

1991-02-19

Morris, Theodore

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group iiia metal or beryllium

423121, 423122, 423123, 423127, 423129, 423130, 423131, 423625, 423628, 423629, 423630, 501153, C01F 700

Patent

active

049942530

ABSTRACT:
A process for the production of large boehmite crystal aggregates, useful for soft polishing applications is provided herein. A caustic aluminate liquor is contacted with an oxygen-containing gas at elevated temperatures and pressures in the presence of about 1-50 mg/L of copper ions. The liquor is oxidized until a molar ratio of Na.sub.2 O.sub.free to Al.sub.2 O.sub.3 of less than or equal to 1 is achieved, and the oxidized liquor is cooled under quiescent conditions of little or no agitation which causes the crystallization and precipitation or novel large boehmite particles.

REFERENCES:
patent: 1943786 (1934-01-01), Cowles
patent: 4046855 (1977-09-01), Schepers et al.
patent: 4101629 (1978-07-01), Mercier
patent: 4117105 (1978-09-01), Hertzenberg et al.
patent: 4157382 (1979-06-01), Goodboy et al.
patent: 4215094 (1980-07-01), Inao et al.
patent: 4263261 (1981-04-01), Yamada et al.
patent: 4280987 (1981-07-01), Yamada et al.
patent: 4492682 (1985-01-01), Trebillon
patent: 4581208 (1986-04-01), The et al.
patent: 4663133 (1987-05-01), Malito et al.
patent: 4668486 (1987-05-01), Brown et al.

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