Process for the production of finely divided silicon dioxide hav

Details Process for the production of finely divided silicon dioxide hav Process for the production of finely divided silicon dioxide hav

1976-01-26

1978-01-10

Cooper, Jack

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423337, C01B 3318

Patent

active

040679543

ABSTRACT:
Process for the production of finely divided silicon dioxide having a surface of more than about 380 m.sup.2 /g BET which comprises converting a volatile silicon halide in an inert gas vehicle with a gas forming water upon combustion and oxygen gas or air in a flame, the quantity of oxygen being sufficient for the practically complete combustion of the combustible gas, and the quantities of oxygen or air and combustible gas being sufficient to produce a quantity of water which will at least suffice for the hydrolysis of the volatile silicon halide, said volatile silicon halide consisting essentially of trichlorosilane and said inert gas vehicle consisting for instance of nitrogen, carbon dioxide, noble gases or others the amount of trichlorosilane vapor being about 410-565 g trichlorosilane vapor per Nm.sup.3 /h total gas, the molar ratio of trichlorosilane vapor to nitrogen being about 0.5:1 - 5:1, the molar ratio of hydrogen in the combustible gas to oxygen being about 0.5:1 - 1.3:1, and separating the resulting silicon dioxide from other reaction products. Finely divided silicon dioxide prepared according to this process is also provided. The finely divided silicon dioxide is useful as a thickening agent in liquid systems.

REFERENCES:
patent: 3660025 (1972-05-01), Driscoll
patent: 3772427 (1973-11-01), Moore

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