Process for the production of finely divided oxides of metals

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423241, 423337, 423592, 423612, 423613, 423625, C01B 3318

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043550150

ABSTRACT:
The residual gas obtained in the pyrogenic production of metal oxides or metalloid oxides contain besides the desired product elemental chlorine if a chlorine containing starting material is employed. After cooling the residual gas the elemental chlorine is reacted to form hydrogen chloride by using an aqueous solution of a reducing agent and in this form the chlorine is subsequently washed out of the residual gas.

REFERENCES:
patent: 2665190 (1954-01-01), Congdon et al.
patent: 3357796 (1967-12-01), Howard et al.
patent: 3896213 (1975-07-01), Hirdler

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