Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1976-01-28
1977-09-13
Carter, Herbert T.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
23277R, 423592, 423612, 423659, 423625, 423608, 423617, 106288B, 106300, 252455R, 252463, 431 3, 431 32, 431326, C01B 3318, C01B 1314
Patent
active
040482901
ABSTRACT:
There is provided a process and apparatus for the production of finely-divided metal and metalloid oxides by flame hydrolysis of corresponding metal and metalloid halides whereby burner fouling is minimized and burner fabrication is facilitated by transpiration of a fuel gas or vapor along the boundaries of each halide-containing stream as it is discharged from the burner into a reaction zone.
REFERENCES:
patent: 2990249 (1961-06-01), Wagner
patent: 3069281 (1962-12-01), Wilson
patent: 3086851 (1963-04-01), Wagner
patent: 3130008 (1964-04-01), Stokes et al.
patent: 3297411 (1967-01-01), Dear
patent: 3355253 (1967-11-01), Tillman et al.
patent: 3475124 (1969-10-01), Dorn et al.
patent: 3647377 (1972-03-01), Hilgers et al.
patent: 3663283 (1972-05-01), Hebert et al.
patent: 3694168 (1972-09-01), Hilgers et al.
patent: 3954945 (1976-05-01), Lange et al.
patent: 3959439 (1976-05-01), Pope
Blaker Barry R.
Cabot Corporation
Carter Herbert T.
Chaletsky Lawrence A.
Schuman Jack
LandOfFree
Process for the production of finely-divided metal and metalloid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the production of finely-divided metal and metalloid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of finely-divided metal and metalloid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-274500