Process for the production of finely-divided metal and metalloid

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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23277R, 423592, 423612, 423659, 423625, 423608, 423617, 106288B, 106300, 252455R, 252463, 431 3, 431 32, 431326, C01B 3318, C01B 1314

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active

040482901

ABSTRACT:
There is provided a process and apparatus for the production of finely-divided metal and metalloid oxides by flame hydrolysis of corresponding metal and metalloid halides whereby burner fouling is minimized and burner fabrication is facilitated by transpiration of a fuel gas or vapor along the boundaries of each halide-containing stream as it is discharged from the burner into a reaction zone.

REFERENCES:
patent: 2990249 (1961-06-01), Wagner
patent: 3069281 (1962-12-01), Wilson
patent: 3086851 (1963-04-01), Wagner
patent: 3130008 (1964-04-01), Stokes et al.
patent: 3297411 (1967-01-01), Dear
patent: 3355253 (1967-11-01), Tillman et al.
patent: 3475124 (1969-10-01), Dorn et al.
patent: 3647377 (1972-03-01), Hilgers et al.
patent: 3663283 (1972-05-01), Hebert et al.
patent: 3694168 (1972-09-01), Hilgers et al.
patent: 3954945 (1976-05-01), Lange et al.
patent: 3959439 (1976-05-01), Pope

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