Process for the production of difluoromethane

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Reexamination Certificate

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C570S171000, C570S178000, C570S181000, C570S243000, C570S260000, C570S262000

Reexamination Certificate

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06844474

ABSTRACT:
The present invention provides a vapor phase process for the production of difluoromethane, HFC-32. The process of this invention provides for the preparation of HFC-32 by a process that exhibits both good product yield and selectivity.

REFERENCES:
patent: 2744148 (1956-05-01), Ruh et al.
patent: 2745886 (1956-05-01), Ruh et al.
patent: 2748177 (1956-05-01), Miller et al.
patent: 3258500 (1966-06-01), Swamer et al.
patent: 3862995 (1975-01-01), Martens et al.
patent: 4147733 (1979-04-01), Fiske et al.
patent: 5208395 (1993-05-01), Elsheikh
patent: 5672786 (1997-09-01), Bonniface et al.
patent: 0 128 510 (1984-12-01), None
patent: 0 508 660 (1992-10-01), None
patent: 9321140 (1993-10-01), None
patent: 9421579 (1994-09-01), None
patent: 9512563 (1995-05-01), None
Patent Abstracts of Japan vol. 18, No. 668 (C-1289), Dec. 16, 1994 and JP,A, 06 263657 (Showa Denko KK), Sep. 20, 1994.
Derwent WPI Acc No: 85-028985-05 Abstract for Showa Denko JP 59225131 (Dec. 18, 1984).

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