Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing
Patent
1991-08-23
1993-07-20
Chaudhuri, Olik
Chemistry of inorganic compounds
Silicon or compound thereof
Halogen containing
423240S, 423326, C04B 6726
Patent
active
052290972
ABSTRACT:
This invention relates to a process for the production of a usable or storable product with a low susceptibility to elutriation by water. This product is produced from residues containing halides obtained from a waste gas cleaning process. The halide containing residues as components of a crude dust having a CaO/SiO.sub.2 ratio between 1.7 and 3.4, are subjected to a thermal treatment to produce chlorosilicates. The waste gases formed during the thermal treatment for chlorosilicate production are subjected to a preliminary cleaning, and are then transported to the waste gas cleaning system of a refuse incineration plant. The residues occurring during the preliminary cleaning can be added to the crude dust.
REFERENCES:
patent: 4116705 (1978-09-01), Chappell
patent: 4226630 (1980-10-01), Styron
patent: 4726940 (1988-02-01), Kobayashi
patent: 4753785 (1988-06-01), Kisters
patent: 4784837 (1988-11-01), Kitayama et al.
patent: 4789532 (1988-12-01), Jons et al.
patent: 4937065 (1990-06-01), Maurer et al.
Gruschka Dietrich
Oberste-Padtberg Rudiger
Opitz Dieter
Roeder Alfred
Chaudhuri Olik
Horton Ken
Rheinische Kalksteinwerke GmbH
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