Process for the production of a two-phase charge shift assembly

Details Process for the production of a two-phase charge shift assembly Process for the production of a two-phase charge shift assembly

1974-08-09

1976-07-06

Tupman, W.

Metal working

Method of mechanical manufacture

Assembling or joining

357 24, 357 91, B01J 1700

Patent

active

039673650

ABSTRACT:
A two-phase charge shift assembly is described, as well as the process for its production. The process consists of applying an insulating layer to a semiconductor substrate, applying a highly ohmic polycrystalline silicon layer to the insulating layer, forming metal electrodes on the polycrystalline layer to thereby protect the zones lying beneath the electrodes, implanting charge carriers by ion implantation in an oblique direction into zones of the layer of polycrystalline silicon to thereby form electrodes in the layer which serve as electrodes between the electrically insulating zones of polycrystalline material.

REFERENCES:
patent: 3796932 (1971-06-01), Amelio
patent: 3829884 (1972-01-01), Borel
patent: 3873371 (1972-11-01), Wolf

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