Process for the production of a thin film optical waveguide of T

Details Process for the production of a thin film optical waveguide of T Process for the production of a thin film optical waveguide of T

1992-11-16

1994-03-15

King, Roy

Optical waveguides

Having particular optical characteristic modifying chemical...

Of waveguide core

427576, 427575, 427569, 427534, 427535, 427539, 427166, 427165, 427309, G02B 600, B05D 306

Patent

active

052952207

ABSTRACT:
A process is disclosed for the production of an optical thin film waveguide of TiO.sub.2 with an attenuation of <5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).

REFERENCES:
patent: 3114652 (1963-12-01), Schetky
patent: 4492620 (1985-01-01), Matsuo et al.
patent: 4873118 (1989-10-01), Elias et al.
patent: 5011705 (1991-04-01), Tanaka
patent: 5017404 (1991-05-01), Paquet et al.
patent: 5030574 (1991-07-01), Vary et al.
patent: 5154943 (1992-10-01), Etzkorn et al.
patent: 5170291 (1992-12-01), Szezyrbowski et al.
Muranova et al., Sov. J. Opt. Technol., 54(1), pp. 22-24 (Jan. 1987).
Hutcheson, Integrated Optical Cirucits and Components, pp. 57-69 (1987).

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