Process for the production of a shielding gas mixture

Compositions – Gaseous compositions

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C219S074000

Reexamination Certificate

active

06991748

ABSTRACT:
In a process for the production of a shielding gas mixture argon is withdrawn from a liquid argon supply, vaporized and mixed with a gas premix. The gas premix contains helium and/or argon and a doping gas. A shielding gas mixture prepared this way is outstandingly suited, especially because of the helium content, for arc welding of aluminum and aluminum alloys.

REFERENCES:
patent: 3526740 (1970-09-01), Brinkmann et al.
patent: 4292493 (1981-09-01), Selander et al.
patent: 5210389 (1993-05-01), Farwer
patent: 5271869 (1993-12-01), Nicoud et al.
patent: 5349152 (1994-09-01), Renner
patent: 5367137 (1994-11-01), Hammarlund et al.
patent: 5396039 (1995-03-01), Chevrel et al.
patent: 5558791 (1996-09-01), Fawer
patent: 6069336 (2000-05-01), Borne et al.
patent: 6564990 (2003-05-01), Nagashima et al.
patent: 6596971 (2003-07-01), Biskup et al.
patent: 2001/0006229 (2001-07-01), Wakum et al.
patent: 634 498 (1983-02-01), None
patent: 4225981 (1994-02-01), None
patent: 0 020 174 (1980-12-01), None
patent: 0020174 (1980-12-01), None
patent: 0544187 (1993-06-01), None
patent: 1 101 599 (2000-11-01), None
patent: 2646496 (1990-11-01), None
patent: 91/13720 (1991-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of a shielding gas mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of a shielding gas mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of a shielding gas mixture will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3591067

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.