Process for the production of a reflection-reducing coating on l

Details Process for the production of a reflection-reducing coating on l Process for the production of a reflection-reducing coating on l

1994-01-04

1997-01-28

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427567, 427574, 427579, 427167, B05D 306, B05D 506, H05H 102, H05H 124

Patent

active

055976220

ABSTRACT:
The invention relates to a process of providing a scratch-resistant coating for a lens made of an optical material comprising synthetics. In order for the synthetic material, for example a CR 39, to be protected against scratches, a very thin adhesion layer of SiO is applied first, and is subsequently provided with a thick SiO.sub.2 layer. Both layers are deposited in a vacuum chamber which comprises both a thermal vaporizer for vaporizing the coating materials and a plasma source for irradiating the substrate simultaneously with application of the vaporized coating material.

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Preprint: Presented at the Sec.PSE Conf. Garmisch-Part. 1990, Article entitled "Ion assisted deposition with a new plasma source" by Matl et al. pp. 1-7 no month.

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