Process for the production of a multicomponent thin film

Details Process for the production of a multicomponent thin film Process for the production of a multicomponent thin film

1984-03-29

1985-01-29

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192C, 427 38, 427 39, 427 42, C23C 1500

Patent

active

044964501

ABSTRACT:
A multicomponent amorphous silicon film suitable for a solar cell is produced at a higher deposition rate by a novel process comprising using jointly a sputtering method and a plasma CVD method within a pressure range of not lower than a pressure at which the maximum film formation rate is given in the sputtering method.

REFERENCES:
patent: 3485666 (1969-12-01), Sterling et al.
patent: 3991229 (1976-11-01), Fengler
patent: 4056642 (1977-11-01), Saxena et al.
patent: 4058638 (1977-11-01), Morton
patent: 4234622 (1980-11-01), Dubuske et al.
patent: 4452828 (1984-06-01), Namba et al.

Affiliated with

Also associated with

Rating

Process for the production of a multicomponent thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of a multicomponent thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of a multicomponent thin film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-505404