Process for the production of 1,1,1-chlorodifluoroethane

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

570168, 570169, C07C 1708

Patent

active

055697933

ABSTRACT:
The invention relates to continuous production of 1,1,1-chlorodifluoroethane from 1,1,1-trichloroethane and hydrofluoric acid by reaction in liquid phase in the presence of at least one fluorination catalyst. According to the invention, the process is carried out under an absolute pressure of between 6 and 30 bars and at a temperature of between 50.degree. and 120.degree. C., the content of catalyst(s) in the reaction mixture, expressed as a percentage by weight of metal, being between 0.05 and 10% and the content of organohalogenated by-products not belonging to series 140 in the reaction mixture being controlled at a value below 40% by weight. This process makes it possible, at the same time, to obtain a high degree of conversion of hydrofluoric acid, to minimize the coproduction of 1,1,1-trifluoroethane and organohalogenated by-products and to facilitate the recovery of the hydrochloric acid formed.

REFERENCES:
patent: 4091043 (1978-05-01), Ohsaka et al.
patent: 4849555 (1989-07-01), Cheminal et al.
J. Soc. Chem Ind vol. 66 pp. 427-429 (1947) Whalley.
Chemicals Abstract, vol. 82, 1975, p. 468, No. 111560v.
Chemical Abstracts, vol. 85, 1976, p. 593, No. 123323v.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the production of 1,1,1-chlorodifluoroethane does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of 1,1,1-chlorodifluoroethane, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of 1,1,1-chlorodifluoroethane will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1786597

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.